The nanoscale dynamic mechanical analysis (nanoDMA) technique is accomplished on a nanoindenter with a dynamic mechanical testing package and heating/cooling stage. It is performed by superimposing a small sinusoidal load on top of a larger quasi-static load during a nanoindentation test. The resultant total indentation displacement into the sample, the dynamic displacement amplitude, and the phase shift from the dynamic load input are recorded and analyzed to yield storage modulus, loss modulus, tangent delta and other mechanical properties and characteristics of the material surfaces.
The nanoDMA technique can be applied for characterizing viscoelastic materials for time dependent properties under controlled temperatures. Typical properties obtained via this powerful technique include complex modulus, storage modulus, loss modulus, tangent delta, frequency dependence, strain rate effect, temperature influence, depth profile, etc.
The new nanoDMA III technology, provided with the Bruker Hysitron TI-980, provides a substantial upgrade over the older technique with the new CMX mode for continuous measurement of a wide range of mechanical properties. Properties such as hardness, loss modulus, tan delta, etc. can be measured as a function of time, frequency, and contact depth. Creep tests can also be performed in which a constant force has a small oscillation superimposed over it. The control software allows tremendous flexibility in adding both quasistatic and dynamic components to the dynamic mechanical test.
Typical Experimental Results
Silicone Rubber 1
Silicone Rubber 2
Polycarbonate
Applications
Complex Modulus | Compression | Controlled Force/Strain Rate |
Creep Compliance | Equilibrium Recoverable Compliance | Film Analysis |
Frequency Effect | Glass Transition | Isostrain |
Loss Modulus | Multi-Frequency | Relaxation Modulus |
Sample Stiffness | Secondary Transitions | Static/Dynamic Force |
Storage Modulus | Storage/Loss Compliance | Stress Relaxation |
Stress/Strain Behavior | Tan Delta | Viscoelastic Characterization |
For more information please read our application notes:
Instrument: Bruker Hysitron TI-980
Key Specifications
Max Dynamic Force Amplitude | 5 mN |
Max Dynamic Displacement Amplitude | 2.5 um |
Displacement Resolution | 0.02 nm |
Force Range | 30 nN to 10 mN |
Force Resolution | 1 nN |
Frequency Range | 0.1 to 300 Hz |
Atmosphere | Open Air, Inert Gas |
Instrument: Multi-Technique and Full-Feature Nanoindentation System
Key Specifications
Temperature Range | 5 to 300 °C |
Displacement Resolution | 0.02 nm |
Force Range | 30 nN to 10 mN |
Force Resolution | 1 nN |
Frequency Range | 1 to 300 Hz |
Atmosphere | Open Air, Inert Gas |